Atomic Force Microscopes, AFM Force Spectroscopy / Measurement, Novascan UV Ozone Cleaners, AFM Bead probes, AFM Chemical Probes, AFM Spring Constant Calibration, Anti-Vibration Acoustic Isolation> </div> <div style=
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
PSD, PSDP and Thermal Series UV Ozone Cleaner:
For Atomically Clean Surfaces, UV Oxidizing, UV Sterilizing and UV Heat Treatment

Introduction: PSD, PSDP and Thermal Series UV Ozone Cleaner

Novascan's Ultraviolet UV Ozone Cleaners are highly published and widely used in industry, production and academics labs to UV clean semiconductor wafers, UV clean LCD surfaces during manufacturing, remove and strip photoresist, improve surface wettability, UV clean AFM probes / tips, UV Clean SEM & TEM samples, UV polymer activation, assembly / bonding of PDMS / glass microfluidic devices, UV clean glass and a host of other UV Ozone cleaning and oxidation applications. (Please below for a list of typical applications.)

Novascan UV Ozone Cleaners have proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm ultraviolet light. In the presence of oxygen, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

To further enhance treatment, the PSDP-UVT UV Ozone cleaners utilize UV Ozone and a thermal stage to achieve more aggressive results by elevating the energy state of the sample surface and by driving off humidity layers that can block oxidation. 

As shown below, AFM was used to document the removal of thick organic contaminants with exposure time using simple room air as an oxygen source (pure oxygen gas may be used for more controlled and aggresive treatment). Additionally contact angle experiments demonstrate dramatic improvements in surface wettability after UV Ozone treatment.

For UV cleaner price quotes, discounts and further information please fill out the "Contact Me" section at the bottom of this page or send email to: info@novascan.com

PSDP-UV UV Ozone cleaner: UV clean glass surfaces, UV clean glass slides, UV clean glass coverslips, UV clean silicon, UV clean wafers, oxidize metals, activate bond PDSM silicone microfluidics, UV clean gold surfaces, UV clean atomic force microscope probes and tips

Read more about:

  • PSD and PSPD Series UV Cleaner - High Performance UV-Ozone Cleaner: UV Ozone Cleaning Systems with 4x4" to 12x16" ... or larger by special order.

  • NEW PRODUCT** Top & Bottom dual lamp UV cleaner systems for wafers and other surfaces. Please Inquire.

  • PSDP-UVT Series Thermal UV Ozone Cleaner - High Performance Thermal UV Ozone Cleaner: UV Ozone Cleaning Systems with Heated Stage and PID Temperature Control
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator

Case Study 1: "New" glass slide and coverslip surfaces are often not clean right out of the box. Surfaces can be easily and quickly cleaned to the atomic level using Novascan UV Ozone Cleaners with just room air.

Wetability of a new glass coverslip before UV Ozone cleaner treatment Wetability of a new glass coverslip after UV Ozone Cleaner treatment

Case Study 2: AFM study of contaminated glass slide surfaces before and after atomic cleaning with a Novascan UV Ozone Cleaner (Note that the data is autoscaled in the last AFM image to reveal the glass grain)

Atomic Force Microscope image of a contaminated glass microscope slide coverslip prior to UV Ozone cleaning Atomic Force Microscope image of a contaminated glass microscope slide coverslip after 10 minutes UV Ozone cleaning Atomic Force Microscope image of a contaminated glass microscope slide coverslip after 20 minutes UV Ozone cleaning

For UV cleaner price quotes, discounts and further information please fill out the "Contact Me" section at the bottom of this page or send email to: info@novascan.com

atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
Novascan UV Ozone Cleaner: Common Materials
  • UV Clean Glass
  • UV Clean Silicon
  • UV Clean Gallium Arsenide
  • UV Clean ITO
  • UV Clean Quartz
  • UV Clean Mica
  • UV Clean Sapphire
  • UV Oxidize Metals
  • UV Clean Ceramics
  • UV Activate Polymers and Crosslink Polymers
  • UV Strip Photo Resist / Photoresist
  • UV Clean Wafers
  • UV Clean Production Line LED displays
  • UV Clean Glass slides and Glass coverslips
  • UV Clean Gold surfaces
  • UV Clean Platinum surfaces
  • UV Activate PDMS for Microfluidic assembles

 

For UV cleaner price quotes, discounts and further information please fill out the "Contact Me" section at the bottom of this page or send email to: info@novascan.com

Novascan UV Ozone Cleaner: Common Applications
  • Atomically clean Semiconductor Silicon Wafers using UV Ozone.
  • Eliminate nasty acid and chemical bath cleaning methods that are dangerous for people and the environment
  • Make Hydrophobic surfaces more Hydrophilic
  • Fast & Simple method to clean AFM, SEM and TEM samples, surfaces and probes UV Ozone
  • Atomically clean glass sides and coverslips
  • Cell culture and cell adhesion surface preparation
  • Preparation for Force Spectroscopy studies
  • Semiconductor Surface UV Oxidation and Preparation
  • For manufacturing of LED displays
  • Cleaning sensitive Lenses and Optics
  • Increased Surface Wettability after UV Ozone cleaning
  • Enhance adhesion of paints, coatings, glues and adhesives
  • UV Ozone Cleaning Quartz and Ceramic Surfaces
  • Improved Thin Film Deposition Quality with UV Ozone
  • Ultraviolet (UV) Curing and crosslinking of polymers and adhesives
  • UV Surface Patterning
  • UV Etching and Surface UV Oxidation
  • An effective, non-destructive, non-vacuum alternative to plasma cleaning
  • UV Ozone Cleaner preparation for Alkanethiol, APTES, silanization and other surface chemistry
  • UV Ozone heat treatment
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator

Sample References: Novascan UV Ozone Cleaner
  1. Low temperature bonding of PMMA and COC microfluidic substrates using UV/ozone surface treatment
    Lab Chip, 2007, 7, 499 – 505
    C. W. Tsao, L. Hromada, J. Liu, P. Kumar and D. L. DeVoe
  2. Fabrication of DNA micropatterns on the polycarbonate surface of compact discs
    Nanoscale Research Letters
    Volume 2 , Number 2/February 2007, pg 69-74
    Zhen Wang and Rong-Xian Li
  3. Structure-Related Initiation of Reentry by Rapid Pacing in Monolayers of Cardiac Cells
    Circ. Res. published online Feb 9, 2006
    Weining Bian and Leslie Tung
  4. Method of imaging low density lipoproteins by atomic force microscopy Microscopy Research and Technique, Volume 70, Issue 10 , Pages 904 - 907
    Julie A. Chouinard , Abdelouahed Khalil, Patrick Vermette
  5. Microfluidic solid phase suspension transport with an elastomer-based, single piezo-actuator, micro throttle pump
    Lab Chip, 2005, 5, 318 - 325
    D. Johnston, M. C. Tracey, J. B. Davis and C. K. L. Tan
  6. Micro throttle pump employing displacement amplification in an elastomeric substrate
    J. Micromech. Microeng. 15 1831-1839
    I D Johnston, M C Tracey, J B Davis and C K L Tan
  7. Continuously variable mixing-ratio micromixer with elastomer valves
    J. Micromech. Microeng. 15 1885-1893
    Christabel K L Tan, Mark C Tracey, John B Davis and Ian D Johnston
  8. Stress creation during Ni–Mn alloy electrodeposition
    J. Appl. Phys. 99, 053517 (2006);
    Sean J. Hearne, Jerrold A. Floro, Mark A. Rodriguez, Ralph T. Tissot, Colleen S. Frazer, Luke Brewer, Paul Hlava, and Stephen Foiles
  9. Stress creation during Ni–Mn alloy electrodeposition
    J. Appl. Phys. 99, 053517 (2006);
    Sean J. Hearne, Jerrold A. Floro, Mark A. Rodriguez, Ralph T. Tissot, Colleen S. Frazer, Luke Brewer, Paul Hlava, and Stephen Foiles
  10. The initial stages of the wearing process of thin polystyrene films studied by atomic force microscopy
    2005 Nanotechnology 16 1213-1220
    M Surtchev1, N R de Souza1,3 and B Jérôme
  11. Vertical phase separation in spin-coated films of a low bandgap polyfluorene/PCBM blend—Effects of specific substrate interaction
    Applied Surface Science Volume 253, Issue 8, 15 February 2007, Pages 3906-3912
    Cecilia M. Björström, Svante Nilsson, Andrzej Bernasik, Andrzej Budkowski, Mats Andersson, Kjell O. Magnusson and Ellen Moons
  12. Multiwell micromechanical cantilever array reader for biotechnology
    Rev. Sci. Instrum. 78, 084103 (2007);
    R. Zhang, A. Best, R. Berger, S. Cherian, S. Lorenzoni, E. Macis, R. Raiteri and R. Cain
  13. AFM study of BSA adlayers on Au stripes
    Applied Surface Science Volume 253, Issue 23, 30 September 2007, Pages 9209-9214
    Michal Tencer, Robert Charbonneau, Nancy Lahoud and Pierre Berini
  14. Condensing and Fluidizing Effects of Ganglioside GM1 on Phospholipid Films
    Biophys. J. BioFAST: First Published January 11, 2008.
    Shelli L Frey , Eva Y Chi , Cristobal Arratia , Jaroslaw Majewski, Kristian Kjaer and Ka Yee C Lee
  15. Confinement and deposition of solution droplets on solvophilic surfaces using a flat high surface energy guide
    Lab Chip, 2007, 7, 483 – 489
    Michal Tencer, Robert Charbonneau and Pierre Berini

For UV cleaner price quotes, discounts and further information please fill out the "Contact Me" section at the bottom of this page or send email to: info@novascan.com

atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator

Book References: UV Ozone Cleaner

  • Microdevices in Biology and Medicine
    Yaakov Nahmias, ‎Sangeeta Bhatia - 2009 - isbn=1596934050
    An alternative method using a commercial UV-ozone (UV O3) source can be used with equal effect as outlined below. 1.4.2.1 Device bonding (with UV O3 surface treatment) 1. Lift cover off of UV O3 machine (Novascan PSD-UV or Jelight UV O3 42

  • Interfacing Microfluidic Bioanalysis with High Sensitivity Mass Spectrometry
    Chia-Wen Tsao - 2008 - isbn=0549576304
    evaluates the utility of UV/O3 surface treatment as a method for effective low temperature polymer microfluidic substrate bonding. ... commercial ozone cleaning system (PSD-UV, Novascan Technologies, Ames, IA

  • Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing
    T. Hattori, ‎T. Hattori, J. Ruzyllo, R. Novak, P. Mertens, P. Besson, ‎J. Ruzyllo - 2009 - isbn=1566777429
    UV O3 + 10min. UV O3 C-C, C-H C-O C=O 275 280 285 290 295 300 Binding Energy (eV) Pristine PR PMOS PR + 5” ash + 15” ... 4 show that narrow resist lines are easy removed whereas larger resist areas are not clean.

  • Lab on a Chip Technology: Fabrication and microfluidics
    K. E. Herold, ‎Avraham Rasooly - 2009 - isbn=1904455468
    More recently, a surface treatment combining UV light and exposure to photogenerated oxygen radicals has been shown ... (Plaskolite) • PSD-UV ozone cleaning system (Novascan Technologies) A B • Vacuum oven (Sheldon Manufacturing) ...

  • MEMS Materials and Processes Handbook
    Reza Ghodssi, ‎Pinyen Lin - 2011 - isbn=0387473181
    Place a clean Si substrate (free of particulates or contamination on the surface) into a UV O3 cleaner with the substrate surface about 2 mm below the light source and expose for 15 min. b. Remove the Si substrate and similarly place the PDMS ...

  • Understanding Microstructure and Charge Transport in Semicrystalline Polythiophenes
    Leslie Hendrix Jimison - 2011
    Prior to film deposition, the cleaned surfaces were subjected to a UV Ozone treatment (Novascan, PSD-UV, UV Surface Contamination System). At this point, the substrates were either ready for polymer deposition or additional surface ...

  • State-of-the-Art Program on Compound Semiconductors 47
    J. Wang - 2007 - isbn=156677571X
    The GaN substrates were cleaned in two ways, by soaking in 50% HCl for 1 min (HCl-treated GaN), and by subsequently cleaning by UV-O3 treatment for 30 min using a Novascan PSD-UVT UV-Ozone system (O3-treated GaN). The HCl ...

  • Structure, Ordering, and Activity of Lipid/polymer Systems
    Shelli Lynne Frey - 2008 - isbn=0549740295
    ... (Veeco Probes, Woodbury, NY), with a nominal spring constant of 0.32 N/m were used; the surface of the tips were decontaminated by UV generated ozone before sampling (PSD-UV Surface Decontamination System, Novascan, Ames, IA

  • Tailoring Surfaces: Modifying Surface Composition and Structure for applications in Tribology, Biology and Catalysis
    Nicholas D. Spencer - 2011 - isbn=9814289426
    Scanning electron micrograph ofthe Novascan AFM cantilever bearing a SiO2 colloid microsphere as the tip, after use for ... Prior to the force measurements the cantilevers were cleaned for 30 min in a UV/Ozone cleaner (UV/ Clean, model ...

  • Characterization of Cylindrical Nano-domains in Thin Films
    Helene C. Maire - 2008 - isbn=0549967222
    PMMA domains were degraded by UV irradiation for 80 minutes using the Novascan PSD-UVT UV-Ozone system under argon atmosphere at λ=250nm, after a 20 minutes argon purge of the chamber. During the UV exposure, the PS domains ...

  • Cell Imaging Techniques: Methods and Protocols
    Douglas J. Taatjes, ‎Brooke T. Mossman - 2006 - isbn=1592599931
    Optional ozone/UV (ultraviolet) decontamination chamber (e.g., Ozone PSD-II; Novascan Technologies, Ames, IA) for cleaning and reusing expensive custom AFM probes. 2.3. AFM System 1. Atomic force microscope compatible with ...

atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
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atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
atomic force microscope uv ozone cleaner afm probe tip acoustic isolator
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